Development of polymeric systems for applications as resists in microelectronics technology

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dc.contributor.authorWright, R. L.(Rodney Lynn)
dc.contributor.otherStellenbosch University. Faculty of . Dept. of .
dc.date.accessioned2012-08-27T12:26:56Z
dc.date.available2012-08-27T12:26:56Z
dc.date.issued1991
dc.descriptionThesis (M. Sc) -- University of Stellenbosch, 1991.
dc.descriptionOne copy microfiche.
dc.descriptionFull text to be digitised and attached to bibliographic record.
dc.format.extent165 leaves : ill.
dc.identifier.urihttp://hdl.handle.net/10019.1/69140
dc.language.isoen_ZA
dc.publisherStellenbosch : Stellenbosch University
dc.rights.holderStellenbosch University
dc.subjectMicroelectronics
dc.subjectPhotoresists
dc.subjectMasks (Electronics)
dc.subjectDissertations -- Chemistry
dc.titleDevelopment of polymeric systems for applications as resists in microelectronics technology
dc.typeThesis
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