Fabrication of Josephson junctions using AFM nanolithography

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dc.contributor.advisor Perold, W. J. en_ZA
dc.contributor.advisor Srinivasu, V. V. en_ZA
dc.contributor.author Elkaseh, Akram Abdulsalam en_ZA
dc.contributor.other University of Stellenbosch. Faculty of Engineering. Dept. of Electrical and Electronic Engineering.
dc.date.accessioned 2010-11-11T14:02:04Z en_ZA
dc.date.accessioned 2010-12-15T10:44:07Z
dc.date.available 2010-11-11T14:02:04Z en_ZA
dc.date.available 2010-12-15T10:44:07Z
dc.date.issued 2010-12 en_ZA
dc.identifier.uri http://hdl.handle.net/10019.1/5421
dc.description Thesis (PhD (Electrical and Electronic Engineering))--University of Stellenbosch, 2010. en_ZA
dc.description Dissertation presented for the degree of Doctor of Philosophy in Engineering at the University of Stellenbosch en_ZA
dc.description.abstract ENGLISH ABSTRACT: Planar weak link structures, such as micro-bridges, variable thickness bridges and nanobridges, have always attracted a lot of attention. Their potential to behave as real Josephson elements make them useful devices, with numerous applications. Powerful techniques, such as focused ion-beam and electron-beam lithography, were successfully used and are well understood in planar weak link structure fabrication. In this dissertation the results of an experimental study on planar weak link structures are presented. For the first time these structures have been successfully fabricated using AFM nanolithography on hard high-temperature superconducting YBCO tracks, where diamond coated silicon tips were used as a ploughing tool. Superconducting YBCO thin films were deposited on different substrates, using inverted cylindrical magnetron sputtering. The films were used to fabricate micro-bridges, variable thickness bridges and nano-bridges, by using conventional photolithography, argon ion-beam milling and AFM nanolithography. The measured I-V characteristics of the fabricated micro-bridges (width down to 1.9 µm), variable thickness bridges (thickness down to 15 nm) and nano-bridge (width down to 490 nm) showed well defined DC and AC Josephson effect characteristics. For better understanding of the behaviour of these types of weak links, critical current versus temperature measurements, and magnetic field modulation of the critical current measurements, were also performed, with the results and discussions given inside the chapters. The major challenges that were experienced in the laboratory during the fabrication processes and the operation of the fabricated devices are also discussed, with the solutions given where appropriate. en_ZA
dc.description.abstract AFRIKAANSE OPSOMMING: Swak-skakel vlakstrukture, soos mikrobr.ue, br.ue met veranderlike dikte en nanobr.ue, het nog altyd baie aandag getrek. Hul het die potensiaal om soos werklike Josephson-elemente te kan funksioneer en is, as gevolg hiervan, nuttige toestelle met veelvuldige toepassings. Kragtige tegnieke, soos gefokuste ioonstraal- en elektronstraal litografie, is suksesvol gebruik en word goed verstaan in die vervaardiging van swak-skakel vlakstrukture. In hierdie proefskrif word die resultate van ¡¦n eksperimentele studie van swak-skakel vlakstrukture voorgel.e. Vir die eerste keer is hierdie strukture suksesvol vervaardig, deur gebruik te maak AFMnanolitografie op harde, ho¡Le-temperatuur supergeleier YBCO (Yttrium Barium Koperoksied) spore, waar diamantbedekte silikonpunte gebruik is as ploeginstrument. ¡¦n Dun lagie van supergeleidende YBCO is op verskillende substrate gedeponeer, deur gebruik te maak van omgekeerde silindriese magnetron verstuiwing. Die dun lagies is gebruik in die vervaardiging van mikrobr.ue, br.ue met veranderlike dikte en nanobr.ue, deur die gebruik van gewone fotolitografie, argon-ioonstraal frees en AFM nanolitografie. Die gemete I-V eienskappe van die vervaardigde mikrobr.ue (met breedte so laag as 1.9 µm), veranderlike-dikte br.ue (dikte tot 15 nm) en nanobr.ue (breedte so min as 490 nm) toon goed gedefinieerde GS en WS eienskappe van die Josephson-effek. Ten einde die gedrag van hierdie tipes swak-skakels beter te kan verstaan, is metings gedoen van kritieke stroom teenoor temperatuur, asook magnetiese veld modulasie van die kritieke stroom. Hierdie resultate en besprekings daarvan word binne die toepaslike hoofstukke aangebied. Die grootste uitdagings wat in die laboratorium, sowel as met die toetsing van die vervaardigde toestelle ondervind is, word ook bespreek. Waar moontlik, word toepaslike oplossings voorgestel. af
dc.format.extent 116 p. : ill.
dc.language.iso en
dc.publisher Stellenbosch : University of Stellenbosch
dc.subject Josephson junctions en_ZA
dc.subject AFM nanolithography en_ZA
dc.subject Dissertations -- Electronic engineering en
dc.subject Theses -- Electronic engineering en
dc.subject Nanotechnology en
dc.subject Atomic force microscope en
dc.subject Yttrium barium copper oxide (YBa2Cu3O7−x) en
dc.subject Superconducting YBCO thin films en
dc.title Fabrication of Josephson junctions using AFM nanolithography en_ZA
dc.type Thesis
dc.rights.holder University of Stellenbosch


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