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Calibrated waveform measurement with high-impedance probes

dc.contributor.authorKabos P.
dc.contributor.authorReader H.C.
dc.contributor.authorArz U.
dc.contributor.authorWilliams D.F.
dc.date.accessioned2011-05-15T16:01:45Z
dc.date.available2011-05-15T16:01:45Z
dc.date.issued2003
dc.identifier.citationIEEE Transactions on Microwave Theory and Techniques
dc.identifier.citation51
dc.identifier.citation2 I
dc.identifier.issn189480
dc.identifier.other10.1109/TMTT.2002.807842
dc.identifier.urihttp://hdl.handle.net/10019.1/12138
dc.description.abstractWe develop an on-wafer waveform calibration technique that combines a frequency-domain mismatch correction to account for the effects of the probe on the measurement with an oscilloscope calibration. The mismatch correction is general and can be applied to any type of microwave probe, including scanning and internal-node probes for noninvasive integrated-circuit tests. We show that, for the commercial high-impedance probe we used, this calibration approach allows accurate on-wafer waveform reconstruction for a variety of probe ground configurations.
dc.subjectFrequency domain analysis
dc.subjectMicrowaves
dc.subjectProbes
dc.subjectWaveform analysis
dc.subjectHigh-impedance probes
dc.subjectElectric impedance
dc.titleCalibrated waveform measurement with high-impedance probes
dc.typeArticle
dc.description.versionArticle


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