Observation of shapiro-steps in AFM-plough micron-size YBCO planar constrictions
Date
2009, 2009
Authors
Srinivasu V.V.
Perold W.J.
Srinivasu V.V.
Perold W.J.
Journal Title
Journal ISSN
Volume Title
Publisher
Abstract
Using an Atomic Force Microscope (AFM), we successfully ploughed micron size planar constriction type junctions on YBa3Cu30 7-x thin films. The 100 nanometer (nm) thin films are deposited on MgO substrates by an Inverted Cylindrical Magnetron (ICM) sputtering technique. The films are then patterned into 8-10 micron size strips, using photolithography and dry etching. A diamond coated tip was used with the AFM in this process. We were able to observe well defined current-voltage (I-V) characteristics and Shapiro-steps, successfully demonstrating a possible Josephson effect in these constrictions. © 2009 IEEE.
Using an Atomic Force Microscope (AFM), we successfully ploughed micron size planar constriction type junctions on YBa3Cu30 7-x thin films. The 100 nanometer (nm) thin films are deposited on MgO substrates by an Inverted Cylindrical Magnetron (ICM) sputtering technique. The films are then patterned into 8-10 micron size strips, using photolithography and dry etching. A diamond coated tip was used with the AFM in this process. We were able to observe well defined current-voltage (I-V) characteristics and Shapiro-steps, successfully demonstrating a possible Josephson effect in these constrictions. © 2009 IEEE.
Using an Atomic Force Microscope (AFM), we successfully ploughed micron size planar constriction type junctions on YBa3Cu30 7-x thin films. The 100 nanometer (nm) thin films are deposited on MgO substrates by an Inverted Cylindrical Magnetron (ICM) sputtering technique. The films are then patterned into 8-10 micron size strips, using photolithography and dry etching. A diamond coated tip was used with the AFM in this process. We were able to observe well defined current-voltage (I-V) characteristics and Shapiro-steps, successfully demonstrating a possible Josephson effect in these constrictions. © 2009 IEEE.
Description
Keywords
AFM; AFM lithography; Atomic force microscopes; Inverted cylindrical magnetron; Josephson effect; Josephson junction; MgO substrate; Micron size; Sputtering techniques; Stripline; YBCO; Atomic force microscopy; Electric potential; Josephson junction devices; Magnetrons; Plasma etching; Quantum optics; Strip telecommunication lines; Thin films; Yttrium barium copper oxides; Current voltage characteristics, AFM, AFM lithography, Atomic force microscopes, Inverted cylindrical magnetron, Josephson effect, Josephson junction, MgO substrate, Micron size, Sputtering techniques, Stripline, YBCO, Atomic force microscopy, Electric potential, Josephson junction devices, Magnetrons, Plasma etching, Quantum optics, Strip telecommunication lines, Thin films, Yttrium barium copper oxides, Current voltage characteristics
Citation
IEEE Transactions on Applied Superconductivity
19
3
IEEE Transactions on Applied Superconductivity
19
3
19
3
IEEE Transactions on Applied Superconductivity
19
3